S. Kosai, R. Inanami, M. Hamada, S. Magoshi, F. Hatori
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Throughput Enhancement in Electron Beam Direct Writing by Multiple-cell Shot Technique for Logic Devices
This paper reports a new pattern design method improving the throughput of the character projection electron beam direct writing (CP-EBDW) lithography for cell-based logic devices. The shot count decreases to approximately one fifth in a 90 nm CMOS technology by assembling the standard cells (SCs) in the physical design stage and exposing them at a time with multiple-cell shot technique. The operating frequency degradation of the logic devices is less than 5 %
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