{"title":"比较了基于硅衬底的硅和立方硅格子pn结的电流电压特性","authors":"Zhi Yang, Yao Ma, Yun Li, Xin Zhao, M. Gong","doi":"10.1109/INEC.2016.7589377","DOIUrl":null,"url":null,"abstract":"Cubic silicon carbide pn junction was synthesized on Silicon substrate by Low pressure chemical vapor deposition. The methane diluted with Hydrogen was used as the reaction carbon source, while silicon substrate was used as the silicon source. The cubic silicon carbide films were characterized by X-ray diffraction, high resolution transmission electron microscopy and current-voltage. It is found that the threshold voltage of cubic silicon carbide is bigger than Si pn junction and the electronic characteristics of cubic silicon carbide pn junction is quite insensitive to ultraviolet light.","PeriodicalId":416565,"journal":{"name":"2016 IEEE International Nanoelectronics Conference (INEC)","volume":"42 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Compared current-voltage characteristics of silicon and cubic silicon caibine pn-junction based on the silicon substrate\",\"authors\":\"Zhi Yang, Yao Ma, Yun Li, Xin Zhao, M. Gong\",\"doi\":\"10.1109/INEC.2016.7589377\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Cubic silicon carbide pn junction was synthesized on Silicon substrate by Low pressure chemical vapor deposition. The methane diluted with Hydrogen was used as the reaction carbon source, while silicon substrate was used as the silicon source. The cubic silicon carbide films were characterized by X-ray diffraction, high resolution transmission electron microscopy and current-voltage. It is found that the threshold voltage of cubic silicon carbide is bigger than Si pn junction and the electronic characteristics of cubic silicon carbide pn junction is quite insensitive to ultraviolet light.\",\"PeriodicalId\":416565,\"journal\":{\"name\":\"2016 IEEE International Nanoelectronics Conference (INEC)\",\"volume\":\"42 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-05-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Nanoelectronics Conference (INEC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INEC.2016.7589377\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Nanoelectronics Conference (INEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INEC.2016.7589377","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Compared current-voltage characteristics of silicon and cubic silicon caibine pn-junction based on the silicon substrate
Cubic silicon carbide pn junction was synthesized on Silicon substrate by Low pressure chemical vapor deposition. The methane diluted with Hydrogen was used as the reaction carbon source, while silicon substrate was used as the silicon source. The cubic silicon carbide films were characterized by X-ray diffraction, high resolution transmission electron microscopy and current-voltage. It is found that the threshold voltage of cubic silicon carbide is bigger than Si pn junction and the electronic characteristics of cubic silicon carbide pn junction is quite insensitive to ultraviolet light.