{"title":"射频CMOS晶体管衬底网络电阻的提取","authors":"M. M. Tabrizi, E. Fathi, M. Fathipour, N. Masoumi","doi":"10.1109/SMIC.2004.1398207","DOIUrl":null,"url":null,"abstract":"Substrate network resistances are analyzed and extracted for multi-finger MOS transistors used in RF applications. The commonly used model for MOS transistors in RF applications mainly consists of a substrate resistance network having three resistors. A typical horse-shoe CMOS transistor is laid out and all substrate resistances are extracted from I-V characteristics. Device and process simulation results for 0.25 /spl mu/m CMOS technology show that the horse-shoe structure decreases the parasitic substrate resistance by 27%. Additionally, we show that the results obtained by the traditional approximation method deviated about 31% from the exact results. Furthermore, with the proposed method, the substrate resistance values can be exactly extracted.","PeriodicalId":288561,"journal":{"name":"Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004.","volume":"63 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Extracting of substrate network resistances in RF CMOS transistors\",\"authors\":\"M. M. Tabrizi, E. Fathi, M. Fathipour, N. Masoumi\",\"doi\":\"10.1109/SMIC.2004.1398207\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Substrate network resistances are analyzed and extracted for multi-finger MOS transistors used in RF applications. The commonly used model for MOS transistors in RF applications mainly consists of a substrate resistance network having three resistors. A typical horse-shoe CMOS transistor is laid out and all substrate resistances are extracted from I-V characteristics. Device and process simulation results for 0.25 /spl mu/m CMOS technology show that the horse-shoe structure decreases the parasitic substrate resistance by 27%. Additionally, we show that the results obtained by the traditional approximation method deviated about 31% from the exact results. Furthermore, with the proposed method, the substrate resistance values can be exactly extracted.\",\"PeriodicalId\":288561,\"journal\":{\"name\":\"Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004.\",\"volume\":\"63 2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMIC.2004.1398207\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. 2004 Topical Meeting onSilicon Monolithic Integrated Circuits in RF Systems, 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMIC.2004.1398207","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Extracting of substrate network resistances in RF CMOS transistors
Substrate network resistances are analyzed and extracted for multi-finger MOS transistors used in RF applications. The commonly used model for MOS transistors in RF applications mainly consists of a substrate resistance network having three resistors. A typical horse-shoe CMOS transistor is laid out and all substrate resistances are extracted from I-V characteristics. Device and process simulation results for 0.25 /spl mu/m CMOS technology show that the horse-shoe structure decreases the parasitic substrate resistance by 27%. Additionally, we show that the results obtained by the traditional approximation method deviated about 31% from the exact results. Furthermore, with the proposed method, the substrate resistance values can be exactly extracted.