0.35μM高压CMOS技术中硬辐射光电二极管的光学和电学模拟

Filip Šegmanović, F. Roger, Gerald Meinhard, I. Jonak-Auer, T. Suligoj
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引用次数: 0

摘要

许多成像应用,如医疗或空间应用,都需要抗辐射传感器。一般来说,在辐射过程中,根据辐射的类型,会产生许多不同的缺陷。利用TCAD软件对硬辐射光电二极管的截面进行了仿真,然后模拟了不同物理参数对硬辐射光电二极管的影响。物理参数,如外延层厚度或体中的陷阱密度,对光电二极管的响应性起着巨大的作用。本文提出了一个改变相关物理参数的变化实验,并对光电二极管的光谱响应度和暗电流进行了分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical and Electrical Simulations of Radiation-Hard Photodiode in 0.35μM High-Voltage CMOS Technology
Many imaging applications, like medical or space applications, require radiation-hard sensors. Generally, during radiation, many different defects are created, depending on the type of the radiation. With TCAD software, cross-section of a radiation-hard photodiode was simulated, and afterwards the impact of different physical parameters was simulated. Physical parameters like epitaxial layer thickness or the trap density in the bulk, play a huge role towards the responsivity of the photodiode. This paper presents a variation experiment, where relevant physical parameters are varied and analysis of the spectral responsivity and dark current of the photodiode is discussed.
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