高效CMOS和SiGe射频功率放大器设计的最新进展

D. Lie, J. Tsay, T. Hall, T. Nukala, Jerry Lopez, Yan Li
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引用次数: 7

摘要

当今世界上大多数射频无线功率放大器(PA)产品仍然采用III-V半导体设计。然而,通过利用纳米硅器件和新颖的射频片上系统(SoC)设计技术,一些研究小组最近报道了在CMOS和SiGe BiCMOS技术中具有高度竞争力的硅RF PAs,其性能可与III-V RF PAs相媲美。因此,我们将介绍硅基PA的最新设计趋势,重点是高效宽带无线和5G PA设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recent progress on high-efficiency CMOS and SiGe RF power amplifier design
The majority of the world's RF wireless power amplifiers (PA) products are still designed in III-V semiconductors today. However, by taking advantage of nm silicon devices and novel RF system-on-a-chip (SoC) design techniques, several groups have recently reported highly-competitive silicon RF PAs in both CMOS and SiGe BiCMOS technologies with performance rivaling those of the III-V RF PAs. We will, therefore, present an up-to-date review on recent design trends of silicon-based PAs, with the focus on high-efficient broadband wireless and 5G PA design.
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