D. Lie, J. Tsay, T. Hall, T. Nukala, Jerry Lopez, Yan Li
{"title":"高效CMOS和SiGe射频功率放大器设计的最新进展","authors":"D. Lie, J. Tsay, T. Hall, T. Nukala, Jerry Lopez, Yan Li","doi":"10.1109/PAWR.2016.7440130","DOIUrl":null,"url":null,"abstract":"The majority of the world's RF wireless power amplifiers (PA) products are still designed in III-V semiconductors today. However, by taking advantage of nm silicon devices and novel RF system-on-a-chip (SoC) design techniques, several groups have recently reported highly-competitive silicon RF PAs in both CMOS and SiGe BiCMOS technologies with performance rivaling those of the III-V RF PAs. We will, therefore, present an up-to-date review on recent design trends of silicon-based PAs, with the focus on high-efficient broadband wireless and 5G PA design.","PeriodicalId":103290,"journal":{"name":"2016 IEEE Topical Conference on Power Amplifiers for Wireless and Radio Applications (PAWR)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-03-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Recent progress on high-efficiency CMOS and SiGe RF power amplifier design\",\"authors\":\"D. Lie, J. Tsay, T. Hall, T. Nukala, Jerry Lopez, Yan Li\",\"doi\":\"10.1109/PAWR.2016.7440130\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The majority of the world's RF wireless power amplifiers (PA) products are still designed in III-V semiconductors today. However, by taking advantage of nm silicon devices and novel RF system-on-a-chip (SoC) design techniques, several groups have recently reported highly-competitive silicon RF PAs in both CMOS and SiGe BiCMOS technologies with performance rivaling those of the III-V RF PAs. We will, therefore, present an up-to-date review on recent design trends of silicon-based PAs, with the focus on high-efficient broadband wireless and 5G PA design.\",\"PeriodicalId\":103290,\"journal\":{\"name\":\"2016 IEEE Topical Conference on Power Amplifiers for Wireless and Radio Applications (PAWR)\",\"volume\":\"13 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-03-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE Topical Conference on Power Amplifiers for Wireless and Radio Applications (PAWR)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PAWR.2016.7440130\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Topical Conference on Power Amplifiers for Wireless and Radio Applications (PAWR)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PAWR.2016.7440130","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Recent progress on high-efficiency CMOS and SiGe RF power amplifier design
The majority of the world's RF wireless power amplifiers (PA) products are still designed in III-V semiconductors today. However, by taking advantage of nm silicon devices and novel RF system-on-a-chip (SoC) design techniques, several groups have recently reported highly-competitive silicon RF PAs in both CMOS and SiGe BiCMOS technologies with performance rivaling those of the III-V RF PAs. We will, therefore, present an up-to-date review on recent design trends of silicon-based PAs, with the focus on high-efficient broadband wireless and 5G PA design.