全群iv光子SiGeSn技术

Shui-Qing Yu, G. Salamo, W. Du, Baohua Li, G. Sun, R. Soref, Yong-Hang Zhang, G. Chang
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引用次数: 0

摘要

SiGeSn半导体为全iv族光电子器件的发展开辟了新的途径[1],[2]。SiGeSn合金独特的光学特性包括:i)一种真正的直接带隙材料,可以证明可以单片集成在Si衬底上的带到带过渡led和激光器[3],[4];Ii)折射率和带隙能量可独立设计,使发射器和光电探测器的工作波长覆盖较宽的近红外和中红外范围[5];iii)完全互补的金属氧化物半导体(CMOS)兼容性允许低成本和高产量的代工制造[6]。本讲座将介绍SiGeSn技术的最新发展进展,包括使用商用化学气相沉积反应器的材料生长,光泵浦和电注入激光器,发光二极管(led)和光电探测器的演示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SiGeSn Technology for All-Group-IV Photonics
The SiGeSn semiconductors have opened a new route for the development of all-group-IV-based optoelectronic devices [1], [2]. The unique optical properties of SiGeSn alloys include: i) a true direct bandgap material leads to the demonstration of band- to-band transition LEDs and lasers that could be monolithically integrated on Si substrates [3], [4]; ii) the refractive index and bandgap energy can be engineered independently, making the operation wavelengths of emitters and photo detectors cover the broad near- and mid-infrared range [5]; and iii) the full complementary metal-oxide-semiconductor (CMOS) compatibility allows for low-cost and high-yield foundry manufacturing [6]. This talk will present the recent progress for the development of SiGeSn technology, including the material growth using commercial chemical vapor deposition reactor, demonstration of optically pumped and electrically injected lasers, light emitting diodes (LEDs) and photodetectors.
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