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引用次数: 6
摘要
本文讨论了一种用于非线性电容表征的基于电荷的电容测量方法。该方法的特点是高分辨率,尽管它是基于在任何普通实验室发现的设备。CBCM最初是为线性互连测量开发的。提出的改进方法使用两个直流扫频源来测量两个极性下的整个非线性Q-v特性,而无需切换被测对象。采用0.35 μ m CMOS工艺设计并制作了实现该方法的测试芯片。对已知电容进行了验证,证明了方法的正确性和准确性。该方法已成功用于全工作电压范围内的MOSCAPs表征。
C-V Characterization of Nonlinear Capacitors using CBCM Method
The paper deals with a modification of CBCM (charge-based capacitance measurements) for nonlinear capacitance characterization. The method is characterized by high resolution although it is based on equipment found in any average laboratory. CBCM was originally developed for linear interconnect measurements. The proposed modification uses two DC swept sources to measure the whole nonlinear Q-v characteristic in both polarities without the necessity to switch the measured object. A test-chip implementing the method was designed and manufactured in 0.35 mum CMOS process. Verification against known capacitances proved the method correctness and accuracy. It was successfully used for MOSCAPs characterization in full operating voltage range.