CdxHg1-xTe梯度隙薄膜的成分分布和结构完善与生长条件的关系

V. Antonov, O. N. Janikay, S. L. Korolyuk, A. Rarenko, Y. Stetsko, E. B. Talyanskiy, Z. Zakharuk, O. O. Bodnaruk
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引用次数: 0

摘要

分析了蒸发冷凝扩散法制备CdxHg1-xTe梯度结构(GSS)在HgTe源CdTe衬底上生长的物理化学过程。将GSS熔化至一定的深度,结晶后在汞蒸气中退火,得到给定成分的结构完美的CdxHg1-xTe外延层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dependence of compositional profile and structural perfection of CdxHg1-xTe graded-gap films on its growing conditions
Physical-chemical processes of CdxHg1-xTe graded structures (GSS) growing by evaporation condensation- diffusion method on CdTe substrates from HgTe source were analyzed. GSS were melted to the necessary depth and after crystallization were annealed in mercury vapor in order to obtain CdxHg1-xTe structure-perfect epitaxial layers of given composition.
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