AlGaN/GaN异质结参数对其电容曲线影响的模拟

J. Osvald
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引用次数: 1

摘要

我们利用泊松方程的解,结合漂移方程和扩散方程,精确地模拟了AlGaN/GaN电容器结构的电压依赖性。我们论证了AlGaN掺杂浓度、肖特基势垒高度和AlGaN层厚度等结构参数对异质结电容器C-V曲线的影响。同时,对结构在正偏压下的电容进行了模拟,并对测量中出现的电容峰值进行了识别。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simulation of Influence of AlGaN/GaN Heterojunction Parameters on Its Capacitance Curves
We used the solution of the Poisson equation together with the drift and diffusion equations to simulate precisely the voltage dependence of the AlGaN/GaN capacitor structure. We demonstrate the influence of the structure parameters like doping concentrations of AlGaN, Schottky barrier height, and the thickness of the AlGaN layer on resulting C-V curve of the heterojunction capacitor. Also the capacitance of the structure in forward bias was simulated and the capacitance peak that sometimes occurs in the measurements was identified.
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