非晶材料的平均间隙模型

N. Tomozeiu
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引用次数: 0

摘要

基于光学跃迁双带模型的“平均间隙”模型很好地描述了非晶半导体子带折射率的色散。由“静电”力和“弹性”力引起的无序势决定了电导带和价带边缘的变化。平均间隙定义为导带底部和价带顶部最可能值之间的差值。该模型应用于a-Si/sub 1-x/C/sub x/:H、a-C:H和a-SiO/sub x/N/sub y/层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On the average-gap model in amorphous materials
The dispersion of the subband refractive index in amorphous semiconductors is well described by "average gap" model which is based on two-band model of optical transitions. The disorder potentials due to the "electrostatic" and "elastic" forces determine the variation of the conduction-and valence-band edges. The average gap is defined as the difference between the most probable values of the bottom of the conduction band and the top of the valence band. The model is applied on a-Si/sub 1-x/C/sub x/:H, a-C:H and a-SiO/sub x/N/sub y/ layers.
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