新型冷阴极三结场发射的理论分析

M. Chung, T. S. Choi, P. H. Cutler, N. Miskovsky
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引用次数: 17

摘要

对金属-介电-真空三重结进行了理论分析。在金属-电介质接触附近观察到电场增强,并认为是由于电介质的存在。问题中的介电增强提出了介电增强电场的新概念,这与通常认为介电减弱电场的观点相反。这种新型的增强归因于介质的极化。研究还发现,金属-介电-真空路径比金属-真空路径对场电子更有利。目前的结果表明,三重结可以作为一种新型的场发射源
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Theoretical analysis of triple junction field emission for a new type of cold cathode
Triple junction of metal-dielectric-vacuum is theoretically analysed. Electric field enhancement is observed in the vicinity of a metal-dielectric contact and considered to be due to the presence of dielectric. The dielectric enhancement in the problem gives rise to a new concept that dielectric can enhance the electric field, which is opposite to the usual view that dielectric reduces the electric field. This new type of enhancement is attributed to the polarization of dielectric. It is also found that the metal-dielectric-vacuum path is more favorable than the metal-vacuum path for field electrons. The present results suggest that the triple junction can be a new type of field emission source
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