硼碳BC3纳米管的空位输运性质

S. Boroznin, I. Zaporotskova, N. Boroznina, P. Zaporotskov, T. Kislova, V. Akatiev, V. Yarmak
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引用次数: 0

摘要

本文给出了B型硼碳纳米管中空位形成的理论研究结果ВСn,其中n = 3。在离子嵌入共价环簇模型、分子簇模型和DFT方法的框架下,采用MNDO方法进行了研究。我们发现,当硼碳纳米管中引入v型缺陷(空位)时,缺陷管的带隙增大。这意味着材料的物理性质可以通过引入缺陷而有目的地改变。模拟了微管中原子键的空位迁移,研究了空位迁移性质。发现沿不同键的缺陷迁移实际上代表了碳或硼离子在纳米管表面稳定状态之间跳跃的过程。计算的活化能值揭示了硼碳管中离子电导率与温度的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Vacancy Transport Properties in Boron-Carbon BC3 Nanotubes
The paper presents results of theoretical research into vacancy formation in B type of boron-carbon nanotubes ВСn, where n = 3. The research was performed using the MNDO method within the framework of an ionic-embedded covalent-cyclic cluster model, molecular cluster model and DFT method. We found that when a V-defect (vacancy) is introduced in a boron-carbon nanotube, the band gap of the defective tubules increases. It means that physical properties of materials can be purposefully changed by introducing defects. Vacancy migration along the atomic bonds in the tubule was simulated and vacancy transport properties were studied. It was found that the defect migration along different bonds actually represents the process of carbon or boron ions hopping between their stable states on the nanotube surface. The calculated activation energy values revealed dependence of ionic conductivity in boron-carbon tubules on temperature.
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