{"title":"描述原子锻造显微图像表面形貌的分形研究","authors":"C. Flueraru, S. Năstase, Ş. Iovan","doi":"10.1109/SMICND.1997.651318","DOIUrl":null,"url":null,"abstract":"Roughness profiles of various polysilicon surface were measured by atomic force microscopy. These profiles are analysed using fractal theory to illustrate the advantage of treating surface morphology from the fractal point of view.","PeriodicalId":144314,"journal":{"name":"1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Fractal study for describing surface morphology from atomic forge microscopy images\",\"authors\":\"C. Flueraru, S. Năstase, Ş. Iovan\",\"doi\":\"10.1109/SMICND.1997.651318\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Roughness profiles of various polysilicon surface were measured by atomic force microscopy. These profiles are analysed using fractal theory to illustrate the advantage of treating surface morphology from the fractal point of view.\",\"PeriodicalId\":144314,\"journal\":{\"name\":\"1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.1997.651318\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.1997.651318","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fractal study for describing surface morphology from atomic forge microscopy images
Roughness profiles of various polysilicon surface were measured by atomic force microscopy. These profiles are analysed using fractal theory to illustrate the advantage of treating surface morphology from the fractal point of view.
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