FinFET电路的故障建模

M. O. Simsir, A. Bhoj, N. Jha
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引用次数: 44

摘要

finfet由于其优越的电特性,有望在不久的将来取代平面CMOS场效应晶体管(fet)。从电路测试的角度来看,目前尚不清楚CMOS故障模型是否足够全面,以模拟FinFET电路中的所有缺陷。在这项工作中,我们使用混合模式Sentaurus TCAD器件模拟解决了上述问题,并证明了虽然为平面mosfet定义的故障与finfet有明显的重叠,但它们不足以涵盖所有的操作机制。结果表明,需要新的故障模型来充分捕捉基于后门打开的独立门finfet和意外蚀刻成独立门结构的短门finfet的逻辑门的行为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fault modeling for FinFET circuits
FinFETs are expected to supplant planar CMOS field-effect transistors (FETs) in the near future, owing to their superior electrical characteristics. From a circuit testing viewpoint, it is unclear if CMOS fault models are comprehensive enough to model all defects in FinFET circuits. In this work, we address the above problem using mixed-mode Sentaurus TCAD device simulations and demonstrate that while faults defined for planar MOSFETs show significant overlaps with FinFETs, they are insufficient to encompass all regimes of operation. Results indicate that new fault models are needed to adequately capture the behavior of logic gates based on independent-gate FinFETs with opens on the back gate, and shorted-gate FinFETs which have been accidentally etched into independent-gate structures.
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