深度耗尽石墨烯-绝缘体-半导体结:一种跨电磁频谱光传感的通用方法(会议报告)

I. Ruiz, M. Goldflam, T. Beechem, S. Howell
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摘要

深耗尽石墨烯-绝缘体-半导体(D2GOS)结由于其高响应性、信噪比和直接读出单个像素的能力,已被证明是一种很有前途的光子探测器件结构。这种结构的独特优势之一是它易于与其他半导体吸收材料交换,实现功能器件的主要警告是能够耗尽石墨烯-绝缘体-半导体(GOS)堆栈中的半导体。这允许通过选择具有适当带隙的大块半导体来设计GOS结以选择性吸收截止。在这项工作中,讨论了使用各种半导体吸收剂(InSb, InAs, InGaAs, Si和CdZnTe)在中红外到伽马射线光谱上展示D2GOS探测器的最新进展,以及与每种吸收剂类型相关的挑战。结果表明,半导体/绝缘体界面缺陷密度和石墨烯迁移率是提高D2GOS结的集成寿命、响应率和信噪比的两个关键因素。半导体/绝缘体界面缺陷的减少是通过采用半导体的表面钝化,通过沉积薄的高质量的氧化物,特定于每个半导体。这被证明可以显著减少器件中的暗电荷产生,从而提高集成寿命、响应性和信噪比。最后,比较了器件在77 K和300 K之间的性能,表明由于暗电荷产生的进一步减少,器件在较低温度下的性能有所提高。桑迪亚国家实验室是一个多任务实验室,由霍尼韦尔国际公司的全资子公司桑迪亚国家技术与工程解决方案公司管理和运营,根据合同DE-NA0003525为美国能源部的国家核安全管理局服务。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The deeply depleted graphene-insulator-semiconductor junction: a versatile approach towards light sensing across the electromagnetic spectrum (Conference Presentation)
The deeply depleted graphene-insulator-semiconductor (D2GOS) junction has been shown to be a promising device structure for photon detection, due to its high responsivity, signal to noise ratio and ability for direct readout of individual pixels. One of the unique advantages of this architecture is its ease of exchangeability to other semiconductor absorber material, with the major caveat of realizing a functional device is to be able to deplete the semiconductor in the graphene-insulator-semiconductor (GOS) stack. This allows the opportunity to design GOS junctions to selective absorption cutoffs by choosing bulk semiconductors with the appropriate bandgaps. In this work, recent progress in demonstrating the D2GOS detectors across the mid-Infrared to gamma ray spectrum is discussed, using a variety of semiconductor absorbers (InSb, InAs, InGaAs, Si, and CdZnTe), along with the challenges associated with working with each absorber type. It is shown that the semiconductor/insulator interface defect density and graphene mobility are the two critical determinants in improving the D2GOS junction’s integration lifetime, responsivity and signal to noise ratio. Reduction of defects the semiconductor/insulator interface are demonstrated by employing surface passivation of the semiconductor through the deposition of a thin high-quality oxide, specific to each semiconductor. This is shown to dramatically reduce the dark charge generation in the device, resulting in improvements in integration lifetime, responsivity and signal to noise ratio. Finally, the device performance between 77 K and 300 K are compared, demonstrating an increase in performance at lower temperatures, due to further reduction of dark charge generation. Sandia National Laboratories is a multimission laboratory managed and operated by National Technology & Engineering Solutions of Sandia, LLC, a wholly owned subsidiary of Honeywell International Inc., for the U.S. Department of Energy’s National Nuclear Security Administration under contract DE-NA0003525.
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