{"title":"一种改进的功率MOSFET,采用一种新颖的分井结构","authors":"J. Zeng, C. F. Wheatley","doi":"10.1109/ISPSD.1999.764098","DOIUrl":null,"url":null,"abstract":"The design trade-offs between the specific on-resistance (R/sub sp/), the ruggedness and the reverse recovery charge (Q/sub rr/) of the body-diode for vertical power MOSFETs has been significantly improved by using a novel split-well (SW) concept. The implementation of the SW structure is straightforward with low cost. It is expected that the source exclusion mask can be removed. When compared to a conventional VDMOST with the same design rules, the SW device provides 15% lower R/sub sp/ and 10% lower Q/sub rr/ without degradation of device ruggedness. In addition, it is expected that the SW device will yield higher hot-carrier reliability.","PeriodicalId":352185,"journal":{"name":"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":"{\"title\":\"An improved power MOSFET using a novel split well structure\",\"authors\":\"J. Zeng, C. F. Wheatley\",\"doi\":\"10.1109/ISPSD.1999.764098\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The design trade-offs between the specific on-resistance (R/sub sp/), the ruggedness and the reverse recovery charge (Q/sub rr/) of the body-diode for vertical power MOSFETs has been significantly improved by using a novel split-well (SW) concept. The implementation of the SW structure is straightforward with low cost. It is expected that the source exclusion mask can be removed. When compared to a conventional VDMOST with the same design rules, the SW device provides 15% lower R/sub sp/ and 10% lower Q/sub rr/ without degradation of device ruggedness. In addition, it is expected that the SW device will yield higher hot-carrier reliability.\",\"PeriodicalId\":352185,\"journal\":{\"name\":\"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-05-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.1999.764098\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.1999.764098","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An improved power MOSFET using a novel split well structure
The design trade-offs between the specific on-resistance (R/sub sp/), the ruggedness and the reverse recovery charge (Q/sub rr/) of the body-diode for vertical power MOSFETs has been significantly improved by using a novel split-well (SW) concept. The implementation of the SW structure is straightforward with low cost. It is expected that the source exclusion mask can be removed. When compared to a conventional VDMOST with the same design rules, the SW device provides 15% lower R/sub sp/ and 10% lower Q/sub rr/ without degradation of device ruggedness. In addition, it is expected that the SW device will yield higher hot-carrier reliability.