气簇离子束加工设备

Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Pub Date : 1900-01-01 DOI:10.1109/IIT.2002.1258094

J. Bachand, A. Freytsis, E. Harrington, M. Gwinn, N. Hofmeester, J. Hautala, M. Mack, K. Regan

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引用次数: 1

摘要

气体簇离子束(GCIB)在包括半导体在内的各种材料的表面平滑和蚀刻方面得到了广泛的应用。Epion开发了商用加工设备，这使得GCIB光束在生产过程中的实际应用成为可能。该设备包括自动配方设置和跟踪。工艺均匀性和重复性优于1%。充电控制使衬底充电小于±6v。高达10瓦/小时的吞吐量可实现与200毫米晶圆。

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Gas cluster ion beam processing equipment

Gas cluster ion beams (GCIB) are finding many applications for surface smoothing and etching of a variety of materials including semiconductors. Epion has developed commercial processing equipment, which makes possible practical application of GCIB beams for production processes. This equipment includes automatic recipe setup and tracking. Process uniformity and repeatability has been demonstrated to be better than 1%. Charge control keeps substrate charging to less than ±6 V. Throughputs as high as 10 W/hr are achievable with 200 mm wafers.

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Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on

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