VeSTIC技术中EEPROM存储器实现的可行性研究

Bartosz Dec, A. Pfitzner
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引用次数: 0

摘要

本文报道了在VeSTIC技术(垂直狭缝晶体管集成电路)中非易失性半导体存储器的初步可行性研究。这项技术的基本概念是十多年前发明的,是一种新颖的3D架构,它使电路布局具有高度的规律性,并且可以进行3D集成。在均匀分布的垂直支柱之间,作为贯穿器件层的电触点,可以制造各种晶体管,并且可以将逻辑元件集成在具有密度特性的画布上用于存储器。在数值模拟的基础上,我们证明了某些EEPROM在VESTICs中实现的可行性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Feasibility Studies of EEPROM Memory Implementations in VeSTIC Technology
This paper reports a preliminary feasibility study of non-volatile semiconductor memories in VeSTIC technology (Vertical Slit Transistor-based Integrated Circuits). The basic concept of this technology, invented over a decade ago, is a novel 3D architecture, which enables high regularity of the circuit layout and is 3D integration ready. Between evenly distributed vertical pillars, being electrical contacts going all the way through the device layer, all kinds of transistors can be fabricated, and integration of logic components in canvas of density characteristic for memories is accessible. Based on numerical simulations we indicated feasibility of certain EEPROM implementations in VESTICs.
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