用水平集方法模拟聚焦离子束加工的三维过程

2010 International Conference on Simulation of Semiconductor Processes and Devices Pub Date : 2010-10-14 DOI:10.1109/SISPAD.2010.5604573

O. Ertl, L. Filipovic, S. Selberherr

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引用次数: 7

摘要

本文首次采用水平集方法对聚焦离子束铣削过程进行了三维模拟。这种方法允许对拓扑变化进行固有的描述。使用蒙特卡罗射线追踪计算表面速率，以便将阴影和再沉积结合起来。并行化用于减少计算时间。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Three-dimensional simulation of focused ion beam processing using the level set method

Three-dimensional simulations of focused ion beam milling, which use the level set method for surface evolution, are presented for the first time. This approach allows the inherent description of topological changes. The surface rates are calculated using Monte Carlo ray tracing in order to incorporate shadowing as well as redeposition. Parallelization is used to reduce the computation time.

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2010 International Conference on Simulation of Semiconductor Processes and Devices

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