掺铁与未掺铁半绝缘InP高温退火后缺陷的比较研究

K. Cherkaoui, S. Kallel, G. Marrakchi, A. Karoui
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引用次数: 0

摘要

利用光导电流瞬态光谱(PICTS)对高温退火处理的铁掺杂或未掺杂半绝缘InP样品进行了研究,以比较所观察到的陷阱。这些样品的PICTS光谱分别显示了大量活化能在0.12 eV到0.66 eV之间的陷阱的存在。在所有样品中并没有清楚地观察到Fe/sub - In/ trap水平。观察到的陷阱的热参数的比较允许将它们中的一些分配给相同的缺陷。然而,对其他陷阱的识别似乎不太明显,而应该与起始材料的性质有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A comparative study of the defects in Fe-doped or undoped semi-insulating InP after high temperature annealing
Fe-doped or undoped semi-insulating InP samples submitted to high temperature annealing process have been studied by Photoinduced current transient spectroscopy (PICTS) in order to compare the traps observed. The PICTS spectra of these samples show separately the presence of a multitude of traps having activation energies ranging from 0.12 eV to 0.66 eV. The Fe/sub In/ trap level has not been clearly observed in all the samples. The comparison of the thermal parameters of the observed traps allows to assign some of them to a same defect. However the identification seems to be less evident concerning other traps and should be rather related to the properties of the starting material.
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