{"title":"为设计而制造:用设计者的语言来控制过程","authors":"D. Potts","doi":"10.1109/ASMC.1998.731551","DOIUrl":null,"url":null,"abstract":"A methodology is presented for evaluation of process control from the designer's perspective, that of overall electrical performance. Technology tables and a comprehensive set of strategically chosen wafer electrical tests are used to capture and maintain the electrical signature of a process.","PeriodicalId":290016,"journal":{"name":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Manufacturing for design: putting process control in the language of the designer\",\"authors\":\"D. Potts\",\"doi\":\"10.1109/ASMC.1998.731551\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A methodology is presented for evaluation of process control from the designer's perspective, that of overall electrical performance. Technology tables and a comprehensive set of strategically chosen wafer electrical tests are used to capture and maintain the electrical signature of a process.\",\"PeriodicalId\":290016,\"journal\":{\"name\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-09-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1998.731551\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1998.731551","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Manufacturing for design: putting process control in the language of the designer
A methodology is presented for evaluation of process control from the designer's perspective, that of overall electrical performance. Technology tables and a comprehensive set of strategically chosen wafer electrical tests are used to capture and maintain the electrical signature of a process.