用无气泡臭氧化去离子水克服清洗障碍

T. Bush, S. Hardwick, M.J. Wikol
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引用次数: 1

摘要

随着300mm晶圆工艺的商业化,对显著减少用水量的需求正在推动革命性的新型湿式清洗工艺的发展。大多数这些新工艺都将臭氧化去离子水作为关键的处理步骤。使用膜接触器将臭氧注入水中,独特地使生产无气泡的去离子水成为可能。无气泡臭氧化流体是下一代关键清洁的关键技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Overcoming the barriers to cleaning with bubble-free ozonated de-ionized water
The need for significant reductions in water consumption as 300 mm wafer processes are commercialized is driving the development of revolutionary new wet cleaning processes. Most of these new processes incorporate ozonated de-ionized water as a key processing step. The use of membrane contactors to infuse ozone into water uniquely enables the production of bubble-free de-ionized water. Bubble-free ozonated fluids are the critical enabling technology for the next generation of critical cleaning.
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