{"title":"用无气泡臭氧化去离子水克服清洗障碍","authors":"T. Bush, S. Hardwick, M.J. Wikol","doi":"10.1109/ASMC.1998.731559","DOIUrl":null,"url":null,"abstract":"The need for significant reductions in water consumption as 300 mm wafer processes are commercialized is driving the development of revolutionary new wet cleaning processes. Most of these new processes incorporate ozonated de-ionized water as a key processing step. The use of membrane contactors to infuse ozone into water uniquely enables the production of bubble-free de-ionized water. Bubble-free ozonated fluids are the critical enabling technology for the next generation of critical cleaning.","PeriodicalId":290016,"journal":{"name":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Overcoming the barriers to cleaning with bubble-free ozonated de-ionized water\",\"authors\":\"T. Bush, S. Hardwick, M.J. Wikol\",\"doi\":\"10.1109/ASMC.1998.731559\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The need for significant reductions in water consumption as 300 mm wafer processes are commercialized is driving the development of revolutionary new wet cleaning processes. Most of these new processes incorporate ozonated de-ionized water as a key processing step. The use of membrane contactors to infuse ozone into water uniquely enables the production of bubble-free de-ionized water. Bubble-free ozonated fluids are the critical enabling technology for the next generation of critical cleaning.\",\"PeriodicalId\":290016,\"journal\":{\"name\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-09-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1998.731559\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1998.731559","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Overcoming the barriers to cleaning with bubble-free ozonated de-ionized water
The need for significant reductions in water consumption as 300 mm wafer processes are commercialized is driving the development of revolutionary new wet cleaning processes. Most of these new processes incorporate ozonated de-ionized water as a key processing step. The use of membrane contactors to infuse ozone into water uniquely enables the production of bubble-free de-ionized water. Bubble-free ozonated fluids are the critical enabling technology for the next generation of critical cleaning.