新型InSb/Si异质结双栅隧道场效应晶体管的设计与分析

S. Ahish, D. Sharma, M. H. Vasantha, Kumar Y. B. Nithin
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引用次数: 7

摘要

本文设计了一种在源-通道结处具有裂袋的InSb/Si异质结异质栅介电双栅TFET (HTFET),并对其模拟/射频性能进行了研究。该器件的模拟/射频性能根据I-V特性、跨电容(gm)、寄生电容、截止频率(fT)和增益带宽积(GBW)进行了分析。仿真得到最大fT为777.8 GHz,最大GBW为393 GHz, ION/IOFF比为1010。此外,利用基于Verilog-A模型的查找表,实现了一个基于HTFET的共源(CS)放大器,进行了电路级性能分析;实现了3db滚降频率55.0981 GHz和单位增益截止频率1.4652 THz。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design and Analysis of Novel InSb/Si Heterojunction Double Gate Tunnel Field Effect Transistor
In this work, an InSb/Si heterojunction hetero gate dielectric double gate TFET (HTFET) having a split pocket at Source-Channel junction has been designed and its analog/RF performance has been investigated. The analog/RF performance of the device is analysed in terms of I-V characteristics, transconsuctance (gm), parasitic capacitances, cut-off frequency (fT) and gain bandwidth product (GBW). Maximum fT of 777.8 GHz, maximum GBW of 393 GHz and a ION/IOFF ratio of 1010 were obtained from the simulations carried out. Further, circuit level performance analysis is performed by implementing a common source (CS) amplifier based on HTFET, using look-up table based Verilog-A model; a 3-dB roll-off frequency of 55.0981 GHz and unity gain cut-off frequency of 1.4652 THz were achieved.
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