利用经典霍尔效应表征氧化铟锡薄膜

L. W. V. van Beveren, E. Panchenko, N. Anachi, L. Hyde, D. Smith, T. James, A. Roberts, J. McCallum
{"title":"利用经典霍尔效应表征氧化铟锡薄膜","authors":"L. W. V. van Beveren, E. Panchenko, N. Anachi, L. Hyde, D. Smith, T. James, A. Roberts, J. McCallum","doi":"10.1109/COMMAD.2014.7038675","DOIUrl":null,"url":null,"abstract":"We have used the classical Hall Effect to electrically characterize indium tin oxide (ITO) films grown by two different techniques on silica substrates. ITO films have the unique property that they can be both electrically conducting (and to be used for a gate electrode for example) as well as optically transparent (at least in the visible part of the spectrum). In the near infrared (NIR) the transmission typically reduces. However, the light absorption can in principle be compensated by growing thinner films.","PeriodicalId":175863,"journal":{"name":"2014 Conference on Optoelectronic and Microelectronic Materials & Devices","volume":"14 5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Indium tin oxide film characterization using the classical Hall Effect\",\"authors\":\"L. W. V. van Beveren, E. Panchenko, N. Anachi, L. Hyde, D. Smith, T. James, A. Roberts, J. McCallum\",\"doi\":\"10.1109/COMMAD.2014.7038675\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have used the classical Hall Effect to electrically characterize indium tin oxide (ITO) films grown by two different techniques on silica substrates. ITO films have the unique property that they can be both electrically conducting (and to be used for a gate electrode for example) as well as optically transparent (at least in the visible part of the spectrum). In the near infrared (NIR) the transmission typically reduces. However, the light absorption can in principle be compensated by growing thinner films.\",\"PeriodicalId\":175863,\"journal\":{\"name\":\"2014 Conference on Optoelectronic and Microelectronic Materials & Devices\",\"volume\":\"14 5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-03-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 Conference on Optoelectronic and Microelectronic Materials & Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/COMMAD.2014.7038675\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 Conference on Optoelectronic and Microelectronic Materials & Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.2014.7038675","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

我们利用经典的霍尔效应对两种不同技术在二氧化硅衬底上生长的氧化铟锡(ITO)薄膜进行了电学表征。ITO薄膜具有独特的特性,即它们既可以导电(例如用于栅极),又可以光学透明(至少在光谱的可见部分)。在近红外(NIR)中,透射率通常会降低。然而,光吸收原则上可以通过生长更薄的薄膜来补偿。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Indium tin oxide film characterization using the classical Hall Effect
We have used the classical Hall Effect to electrically characterize indium tin oxide (ITO) films grown by two different techniques on silica substrates. ITO films have the unique property that they can be both electrically conducting (and to be used for a gate electrode for example) as well as optically transparent (at least in the visible part of the spectrum). In the near infrared (NIR) the transmission typically reduces. However, the light absorption can in principle be compensated by growing thinner films.
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