掺硫InP MLEC晶体生长过程中位错在种晶界面附近的产生和扩展

D. Bliss, J. Zhao, G. Bryant, R. Lancto, M. Dudley, V. Prasad
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引用次数: 3

摘要

通过控制晶颈的形状和生长速率,研究了InP块状晶体中位错的产生和扩展机理。利用x射线白束同步辐射形貌研究了故意缩颈在掺杂硫的InP晶体MLEC生长中的有效性。对于定向的种子,12倍滑移系统排列在离种子轴35/spl度/处。在这些晶体横截面的地形图中可以观察到位错[110]。在晶种界面处产生的高密度位错向外围扩散。还可以看到与硫分布有关的条纹。当热漂移引起生长速率的瞬时变化时,这些条纹描绘了固-熔界面。为了确定界面形状和位错密度之间的关系,本研究特意改变了生长过程中的拉拔速率。结果表明,缩颈过程对促进高完美InP单晶的生长起着至关重要的作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dislocation generation and propagation near the seed-crystal interface during MLEC crystal growth of sulfur-doped InP
The mechanism of dislocation generation and propagation in InP bulk crystals has been studied by controlling the shape and the growth rate of the neck. The effectiveness of deliberate necking in MLEC crystal growth of sulfur-doped InP crystals has been studied by X-ray white beam synchrotron radiation topography. For seeds oriented in the <100> direction, the twelve-fold slip systems are arrayed at 35/spl deg/ from the seed axis. Dislocations are observed in topographic views of the [110] cross-section of these crystals. The high density of dislocations generated at the seed-crystal interface is seen to propagate outward toward the periphery. Also seen are the striations associated with the sulfur distribution. These striations delineate the solid-melt interface as thermal excursions cause instantaneous changes in growth rate. For this study, the pulling rate was deliberately varied during growth, to determine the relationship between interface shape and dislocation density. The results show the necking process is of crucial importance to promote the growth of highly perfect InP single crystals.
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