先进光刻技术中的图案粗糙度分析:功率谱密度和自相关

Yuyang Bian, Xijun Guan, Biqiu Liu, Xiaobo Guo, Cong Zhang, Jun Huang, Yu Zhang
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引用次数: 0

摘要

随着先进光刻工艺的发展,同时减小线宽和边缘粗糙度以及缩小主要特征的临界尺寸是一个不断的挑战。近年来,将功率谱密度法引入到图案粗糙度分析中。通过功率谱密度分析,对扫描电镜各测点数据进行傅里叶变换处理,将被检测图案的粗糙度行为从空间域转换到频域。自相关分析是识别线宽或边缘粗糙度周期特性的有效手段。本研究采用功率谱密度法、自相关法和标准差法对不同光刻条件下密纹的粗糙度进行了表征,包括底层增透涂层材料的反射率、光刻胶、照度和曝光后烘烤温度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pattern Roughness Analyses in Advanced Lithography: Power Spectral Density and Autocorrelation
With development of advanced lithography processes, simultaneous reduction of line width and edge roughness along with the shrinkage of critical dimension of main feature is a continuous challenge. Recent years, unbiased roughness characterization was introduced in pattern roughness analysis by applying power spectral density method. Through power spectral density analysis, the data of all measurement points from scanning electron microscope are processed by Fourier transform, and the roughness behaviors of inspected pattern are converted from spatial domain to frequency domain. Autocorrelation analysis is an effective means to identify the periodic behavior of line width or edge roughness. In our research, roughness of dense lines under different lithography conditions, including reflectivity of bottom anti-reflection coating materials, photoresist, illumination and post exposure bake temperature, was characterized using power spectral density, autocorrelation methods as well as with standard deviation.
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