{"title":"GaAs技术中用于静电放电保护的新型无漏极多栅极pHEMT","authors":"Q. Cui, J. Liou","doi":"10.1109/IRPS.2013.6532073","DOIUrl":null,"url":null,"abstract":"Electrostatic discharge (ESD) protection structures in GaAs HEMT technology are commonly constructed using either stacked Schottky diode or Single-Gate clamp. Dual-gate pHEMT clamp was also recently reported for its better ESD robustness performance. This paper further develops an improved ESD protection clamp based on a novel drainless, multi-gate pHEMT in 0.5um GaAs pHEMT technology. With similar layout area, the proposed ESD protection clamp can carry much higher current handling ability (5.2-A “It2”, roughly 7.8-kV HBM ESD level) than both the conventional single-gate pHEMT clamp and recently reported dual-gate pHEMT clamp under the human body model (HBM) stress.","PeriodicalId":138206,"journal":{"name":"2013 IEEE International Reliability Physics Symposium (IRPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-04-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Novel drain-less multi-gate pHEMT for electrostatic discharge (ESD) protection in GaAs technology\",\"authors\":\"Q. Cui, J. Liou\",\"doi\":\"10.1109/IRPS.2013.6532073\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Electrostatic discharge (ESD) protection structures in GaAs HEMT technology are commonly constructed using either stacked Schottky diode or Single-Gate clamp. Dual-gate pHEMT clamp was also recently reported for its better ESD robustness performance. This paper further develops an improved ESD protection clamp based on a novel drainless, multi-gate pHEMT in 0.5um GaAs pHEMT technology. With similar layout area, the proposed ESD protection clamp can carry much higher current handling ability (5.2-A “It2”, roughly 7.8-kV HBM ESD level) than both the conventional single-gate pHEMT clamp and recently reported dual-gate pHEMT clamp under the human body model (HBM) stress.\",\"PeriodicalId\":138206,\"journal\":{\"name\":\"2013 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-04-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS.2013.6532073\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2013.6532073","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Novel drain-less multi-gate pHEMT for electrostatic discharge (ESD) protection in GaAs technology
Electrostatic discharge (ESD) protection structures in GaAs HEMT technology are commonly constructed using either stacked Schottky diode or Single-Gate clamp. Dual-gate pHEMT clamp was also recently reported for its better ESD robustness performance. This paper further develops an improved ESD protection clamp based on a novel drainless, multi-gate pHEMT in 0.5um GaAs pHEMT technology. With similar layout area, the proposed ESD protection clamp can carry much higher current handling ability (5.2-A “It2”, roughly 7.8-kV HBM ESD level) than both the conventional single-gate pHEMT clamp and recently reported dual-gate pHEMT clamp under the human body model (HBM) stress.