GaAs技术中用于静电放电保护的新型无漏极多栅极pHEMT

Q. Cui, J. Liou
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引用次数: 0

摘要

GaAs HEMT技术中的静电放电(ESD)保护结构通常采用堆叠肖特基二极管或单栅极箝位来构建。双栅pHEMT钳最近也因其更好的ESD稳健性而被报道。本文进一步开发了一种基于0.5um GaAs pHEMT技术的新型无漏、多栅极pHEMT的改进ESD保护钳。在相似的布局面积下,与传统的单门pHEMT钳和最近报道的双门pHEMT钳相比,所提出的ESD保护钳在人体模型(HBM)应力下具有更高的电流处理能力(5.2 a“It2”,大约7.8 kv HBM ESD水平)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Novel drain-less multi-gate pHEMT for electrostatic discharge (ESD) protection in GaAs technology
Electrostatic discharge (ESD) protection structures in GaAs HEMT technology are commonly constructed using either stacked Schottky diode or Single-Gate clamp. Dual-gate pHEMT clamp was also recently reported for its better ESD robustness performance. This paper further develops an improved ESD protection clamp based on a novel drainless, multi-gate pHEMT in 0.5um GaAs pHEMT technology. With similar layout area, the proposed ESD protection clamp can carry much higher current handling ability (5.2-A “It2”, roughly 7.8-kV HBM ESD level) than both the conventional single-gate pHEMT clamp and recently reported dual-gate pHEMT clamp under the human body model (HBM) stress.
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