制程电压温度变化对混合型SET-FET电路性能的影响

E. Amat, J. Bausells, F. Pérez-Murano
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引用次数: 2

摘要

该贡献研究了在考虑不同场效应晶体管(例如纳米线、UTBB FDSOI和FinFET)时,实现混合CMOS-SET器件在性能和可变性容限方面的改进。基于纳米线的SET-FET具有最高的集成度和显著的驱动电流增加和可变性缓解。此外,基于UTBB FDSOI的SET-FET实现允许使用体偏置电压,并且允许动态地和更准确地管理整个器件响应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of Process-Voltage-Temperature variations on the behavior of a hybrid SET-FET circuit
This contribution studies the improvements, in terms of performance and variability tolerance, of implementing an hybrid CMOS-SET device when different Field Effect Transistors are regarded, e.g. Nanowire, UTBB FDSOI and FinFET. The Nanowire-based SET-FET presents the highest integration level and a significant increase of drive current and variability mitigation. Moreover, the SET-FET implementation based on UTBB FDSOI allows the use of body-bias voltage and it permits to manage dynamically and more accurately the whole device response.
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