EUVL掩模衬布中的“仅光化”缺陷——原生缺陷，几乎无法通过可见光检查检测到

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-01 DOI:10.1109/IMNC.2001.984102

M. Yi, T. Haga, C. Walton, J. Bokor

{"title":"EUVL掩模衬布中的“仅光化”缺陷——原生缺陷，几乎无法通过可见光检查检测到","authors":"M. Yi, T. Haga, C. Walton, J. Bokor","doi":"10.1109/IMNC.2001.984102","DOIUrl":null,"url":null,"abstract":"An actinic (at-wavelength) inspection technology is essential for learning the nature of defects at the developmental stage of the technology and for eventually qualifying less costly non-EUV inspection methods. In this paper, we discuss recent results of actinic defect counting experiments covering several cm/sup 2/ area. Results include some small actinic-only defects, not detected by optical inspection tools, and a new class of relatively large, absorbing defects.","PeriodicalId":202620,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"\\\"Actinic-only\\\" defects in EUVL mask blanks-native defects, barely detectable by visible-light inspection\",\"authors\":\"M. Yi, T. Haga, C. Walton, J. Bokor\",\"doi\":\"10.1109/IMNC.2001.984102\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An actinic (at-wavelength) inspection technology is essential for learning the nature of defects at the developmental stage of the technology and for eventually qualifying less costly non-EUV inspection methods. In this paper, we discuss recent results of actinic defect counting experiments covering several cm/sup 2/ area. Results include some small actinic-only defects, not detected by optical inspection tools, and a new class of relatively large, absorbing defects.\",\"PeriodicalId\":202620,\"journal\":{\"name\":\"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.2001.984102\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2001.984102","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

光化(波长)检测技术对于在技术发展阶段了解缺陷的性质以及最终确定成本更低的非euv检测方法至关重要。本文讨论了近年来覆盖数cm/sup /面积的光化缺陷计数实验结果。结果包括一些小的光化缺陷，光学检测工具无法检测到，以及一类相对较大的吸收性缺陷。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

"Actinic-only" defects in EUVL mask blanks-native defects, barely detectable by visible-light inspection

An actinic (at-wavelength) inspection technology is essential for learning the nature of defects at the developmental stage of the technology and for eventually qualifying less costly non-EUV inspection methods. In this paper, we discuss recent results of actinic defect counting experiments covering several cm/sup 2/ area. Results include some small actinic-only defects, not detected by optical inspection tools, and a new class of relatively large, absorbing defects.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

自引率

0.00%

发文量