一种基于mems的复合衬底柔性电极阵列

2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC) Pub Date : 2010-12-01 DOI:10.1109/EDSSC.2010.5713778

T. Ren, B. Yan, Jian-Hui Lin, Xiaoming Wu, Li-gang Wang, Yi Yang, Li-tian Liu

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引用次数: 6

摘要

我们提出了一种基于mems的柔性硬膜下电极阵列用于神经记录。电极阵列是在聚酰亚胺和生物医学级聚二甲基硅氧烷(PDMS)的复合衬底上制造的。电极沉积在聚酰亚胺层上，整个器件采用PDMS封装。用CO2激光进行烧蚀以暴露电极部位。对电极表面进行修饰以增加表面积，可使界面阻抗降低近90%。制备了暴露电极直径分别为0.5mm和2.3mm的2×4和2×1阵列原型。全封装后，电极阵列整体厚度为0.7mm。对于2×4阵列，普通0.5mm电极的平均电极阻抗为18.9 kΩ，而表面修饰0.5mm电极的平均电极阻抗为1.58kΩ。2×1阵列成功地植入兔子的脑膜下，并获得其脑皮质电图(ECoG)。

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A MEMS-based flexible electrode array using composite substrate

We present a MEMS-based flexible subdural electrode array for neural recordings. The electrode array is fabricated on a composite substrate of polyimide and biomedical-grade polydimethylsiloxane(PDMS). The electrodes are deposited on polyimide layer, and the whole device is packaged by PDMS. Ablating with a CO2 laser is applied to expose the electrodes sites. The surface of the electrodes is modified to increase the surface area, which can decrease interface impedance by nearly 90%. Prototypes of 2×4 and 2×1 arrays are fabricated with exposed electrode diameters of 0.5mm and 2.3mm respectively. After full package, the whole thickness of the electrode array is 0.7mm. For the 2×4 array, the average electrode impedance is 18.9 kΩ for normal 0.5mm electrodes and only 1.58kΩ for surface modified 0.5mm electrodes. The 2×1 array was successfully subdural implanted into a rabbit's brain, and get its electro-corticogram(ECoG).

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来源期刊

2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)

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