Alireza Nassiri, R. Kustom, F. E. Mills, Y. W. Kang, A. Feinerman, H. Henke, P. Matthews, T. L. Willke, D. Grudzien, J. Song, D. Horan
{"title":"用于产生可调谐短波同步辐射的50兆电子毫米波电子直线加速器系统","authors":"Alireza Nassiri, R. Kustom, F. E. Mills, Y. W. Kang, A. Feinerman, H. Henke, P. Matthews, T. L. Willke, D. Grudzien, J. Song, D. Horan","doi":"10.1109/IEDM.1993.347373","DOIUrl":null,"url":null,"abstract":"The Advanced Photon Source (APS) at Argonne in collaboration with the University of Illinois at Chicago and the University of Wisconsin at Madison is developing a new millimeter wavelength, 50-MeV electron linear accelerator system for production of coherent tunable wavelength synchroton radiation. Modern micromachining techniques based on deep etch x-ray lithography, LIGA (Lithografie, Galvanoforming, Abformung), capable of producing high-aspect ratio structures are being considered for the fabrication of the accelerating components.<<ETX>>","PeriodicalId":346650,"journal":{"name":"Proceedings of IEEE International Electron Devices Meeting","volume":"51 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":"{\"title\":\"A 50-MeV mm-wave electron linear accelerator system for production of tunable short wavelength synchrotron radiation\",\"authors\":\"Alireza Nassiri, R. Kustom, F. E. Mills, Y. W. Kang, A. Feinerman, H. Henke, P. Matthews, T. L. Willke, D. Grudzien, J. Song, D. Horan\",\"doi\":\"10.1109/IEDM.1993.347373\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Advanced Photon Source (APS) at Argonne in collaboration with the University of Illinois at Chicago and the University of Wisconsin at Madison is developing a new millimeter wavelength, 50-MeV electron linear accelerator system for production of coherent tunable wavelength synchroton radiation. Modern micromachining techniques based on deep etch x-ray lithography, LIGA (Lithografie, Galvanoforming, Abformung), capable of producing high-aspect ratio structures are being considered for the fabrication of the accelerating components.<<ETX>>\",\"PeriodicalId\":346650,\"journal\":{\"name\":\"Proceedings of IEEE International Electron Devices Meeting\",\"volume\":\"51 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-12-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"12\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of IEEE International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.1993.347373\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of IEEE International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1993.347373","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 50-MeV mm-wave electron linear accelerator system for production of tunable short wavelength synchrotron radiation
The Advanced Photon Source (APS) at Argonne in collaboration with the University of Illinois at Chicago and the University of Wisconsin at Madison is developing a new millimeter wavelength, 50-MeV electron linear accelerator system for production of coherent tunable wavelength synchroton radiation. Modern micromachining techniques based on deep etch x-ray lithography, LIGA (Lithografie, Galvanoforming, Abformung), capable of producing high-aspect ratio structures are being considered for the fabrication of the accelerating components.<>