EUV成像系统的发展进展

Extreme Ultraviolet Lithography (TOPS) Pub Date : 1900-01-01 DOI:10.1364/eul.1996.eww2

D. Tichenor, A. Ray-Chaudhuri, G. Kubiak, K. Nguyen, S. Haney, K. Berger, R. Nissen, Y. Perras, P. Jin, L. I. Weingarten, P. Keifer, R. Stulen, R. Shagam, W. Sweatt, T. G. Smith, O. Wood, A. MacDowell, J. Bjorkholm, T. Jewell, F. Zernike, B. Fix, H. Hauschildt

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引用次数: 1

摘要

制作了一种由3个非球面反射镜组成的极紫外环场相机，并利用可见光对其进行了评价。在1 mm × 25 mm视场范围内，波前误差(WFE)的RMS为2.5 nm。在一个10倍史瓦西光学，具有0.4毫米直径的视野，一个光学测量的WFE的RMS为1纳米已经实现。用史瓦西照相机在抗蚀剂中记录的EUV图像显示。描述了将该相机集成到用于器件制造实验的实验室工具中。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Progress in the Development of EUV Imaging Systems

An extreme ultraviolet (EUV) ring-field camera, comprised of 3 aspheric mirrors, has been fabricated and evaluated using visible light. The wavefront error (WFE) within a 1 mm × 25 mm field of view is 2.5 nm RMS. In a 10x Schwarzschild optic, having a 0.4 mm diameter field of view, an optically measured WFE of 1 nm RMS has been achieved. EUV images recorded in resist using the Schwarzschild camera are shown. The integration of this camera into a laboratory tool for device fabrication experiments is described.

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Extreme Ultraviolet Lithography (TOPS)

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