采用45nm多通道场效应晶体管技术的低功耗、高稳定性6T SRAM单元

O. Thomas, B. Guillaumot, T. Ernst, B. Cousin, O. Rozeau
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引用次数: 2

摘要

本文提出了一种新颖的3D CMOS 6T SRAM单元设计,采用多通道(MC)场效应晶体管技术,可以很好地适应每个器件的通道数。基于硅测量,建立了45纳米MCFET的仿真模型。通过仿真验证的电学结果表明,与2D设计的标准CMOS 6T SRAM单元相比,在相同的面积和读取访问时间下,功耗降低了25%以上,电池稳定性提高了17%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A power-efficient impoved-stability 6T SRAM cell in 45nm Multi-Channel FET technology
This paper presents an innovative 3D CMOS 6T SRAM cell design in multi-channel (MC) FET technology by well adapting the number of channels per device. A simulation model for the 45 nm MCFET has been developed based on silicon measurements. The electrical results validated by simulations, exhibit more than 25% power dissipation reduction and 17% cell stability improvement for the same area and read access time, when compared with a standard CMOS 6T SRAM cell designed in 2D.
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