热接触电阻:弹性变形的影响[微电子封装]

M. Bahrami, M. Yovanovich, J. Culham
{"title":"热接触电阻:弹性变形的影响[微电子封装]","authors":"M. Bahrami, M. Yovanovich, J. Culham","doi":"10.1109/STHERM.2005.1412158","DOIUrl":null,"url":null,"abstract":"Existing models over-predict the thermal contact resistance of conforming rough joints at low contact pressures. However, the applicable pressure range in the microelectronics industry is low due to load constraints. In this paper, a new model is presented which is more suitable for low pressures. The present model assumes plastic deformation at microcontacts. The effect of elastic deformations beneath the microcontacts is determined by superimposing normal deformations in an elastic half-space due to adjacent microcontacts. The model also accounts for the variation of the effective microhardness. A parametric study is conducted to investigate the effects of main contact input parameters on the elastic effect. The study reveals that the elastic deformation effect is an important phenomenon especially in low contact pressures. The present model is compared with experimental data and good agreement is observed at low contact pressures.","PeriodicalId":256936,"journal":{"name":"Semiconductor Thermal Measurement and Management IEEE Twenty First Annual IEEE Symposium, 2005.","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Thermal contact resistance: effect of elastic deformation [microelectronics packaging]\",\"authors\":\"M. Bahrami, M. Yovanovich, J. Culham\",\"doi\":\"10.1109/STHERM.2005.1412158\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Existing models over-predict the thermal contact resistance of conforming rough joints at low contact pressures. However, the applicable pressure range in the microelectronics industry is low due to load constraints. In this paper, a new model is presented which is more suitable for low pressures. The present model assumes plastic deformation at microcontacts. The effect of elastic deformations beneath the microcontacts is determined by superimposing normal deformations in an elastic half-space due to adjacent microcontacts. The model also accounts for the variation of the effective microhardness. A parametric study is conducted to investigate the effects of main contact input parameters on the elastic effect. The study reveals that the elastic deformation effect is an important phenomenon especially in low contact pressures. The present model is compared with experimental data and good agreement is observed at low contact pressures.\",\"PeriodicalId\":256936,\"journal\":{\"name\":\"Semiconductor Thermal Measurement and Management IEEE Twenty First Annual IEEE Symposium, 2005.\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-03-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor Thermal Measurement and Management IEEE Twenty First Annual IEEE Symposium, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/STHERM.2005.1412158\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Thermal Measurement and Management IEEE Twenty First Annual IEEE Symposium, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/STHERM.2005.1412158","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

现有模型对低接触压力条件下的粗糙接头的接触热阻预测过高。然而,由于负载的限制,在微电子工业中适用的压力范围很低。本文提出了一种更适用于低压的新模型。本模型假定微接触处存在塑性变形。通过在弹性半空间中叠加相邻微触点引起的法向变形来确定微触点下弹性变形的影响。该模型还考虑了有效显微硬度的变化。对主要接触输入参数对弹性效应的影响进行了参数化研究。研究表明,弹性变形效应是一个重要的现象,特别是在低接触压力下。将模型与实验数据进行了比较,发现在低接触压力下模型与实验数据吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal contact resistance: effect of elastic deformation [microelectronics packaging]
Existing models over-predict the thermal contact resistance of conforming rough joints at low contact pressures. However, the applicable pressure range in the microelectronics industry is low due to load constraints. In this paper, a new model is presented which is more suitable for low pressures. The present model assumes plastic deformation at microcontacts. The effect of elastic deformations beneath the microcontacts is determined by superimposing normal deformations in an elastic half-space due to adjacent microcontacts. The model also accounts for the variation of the effective microhardness. A parametric study is conducted to investigate the effects of main contact input parameters on the elastic effect. The study reveals that the elastic deformation effect is an important phenomenon especially in low contact pressures. The present model is compared with experimental data and good agreement is observed at low contact pressures.
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