辐射硬体CMOS ROM剂量率扰动:详细分析技术及结果

A. Nikiforov, V.N. Guminov, V. A. Telets
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引用次数: 1

摘要

利用“RADON-5E”脉冲激光模拟器对辐射硬体互补金属氧化物半导体只读存储器(CMOS ROM)系列进行了详细的剂量率效应研究。采用低阻抗探针技术测量芯片内部沿信息路径的瞬态响应。研究发现,ROM剂量率扰动电平是由前置放大器扰动电平决定的。得到并分析了ROM扰动持续时间与工作频率的本质关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation hard bulk CMOS ROM dose rate upset: detailed analysis technique and results
The detailed dose rate effects investigation of a Radiation Hard Bulk Complementary Metal-Oxide-Semiconductor Read Only Memory (CMOS ROM) family is performed with the "RADON-5E" pulsed laser simulator. The low-impedance probe technique is used to measure transient responses along the information path inside the chip. It is found that the ROM dose rate upset level is determined by the preamplifier's upset level. The essential dependence of ROM upset duration on the operational frequency is obtained and analyzed.
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