硅谐振隧道二极管射频振荡器的挑战与展望

E. Buccafurri, A. Medjahdi, F. Calmon, R. Clerc, M. Pala, A. Poncet, G. Ghibaudo
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引用次数: 1

摘要

先进的SOI和应变SOI (s-SOI)技术可能是在硅工艺中集成谐振隧道二极管(RTD)的另一种选择。为了研究这些技术的预期性能,提出了一个完整的直流和交流紧凑的硅RTD模型,并在电路模拟器中实现。基于RTD的射频振荡器已被模拟并与更传统的硅电路进行了比较。即使基于SOI的RTD提供的性能低于III-V的RTD,事实证明,使用该技术可以在硅上实现20 GHz的极低功率RF振荡器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Challenges and prospects of RF oscillators using silicon resonant tunneling diodes
Advanced SOI and strained-SOI (s-SOI) technologies may be an alternative option to integrate Resonant Tunneling Diodes (RTD) in a silicon process. To investigate the expected performances of such technologies, a complete DC and AC compact model of silicon RTD has been proposed, and implemented in a circuit simulator. RTD based RF oscillators have been simulated and compared to more conventional silicon circuits. Even if SOI based RTD offers lower performances than their III-V counterparts, it turns out that extremely low power RF oscillator at 20 GHz can be realized on silicon using this technology.
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