E. Buccafurri, A. Medjahdi, F. Calmon, R. Clerc, M. Pala, A. Poncet, G. Ghibaudo
{"title":"硅谐振隧道二极管射频振荡器的挑战与展望","authors":"E. Buccafurri, A. Medjahdi, F. Calmon, R. Clerc, M. Pala, A. Poncet, G. Ghibaudo","doi":"10.1109/ESSCIRC.2009.5325989","DOIUrl":null,"url":null,"abstract":"Advanced SOI and strained-SOI (s-SOI) technologies may be an alternative option to integrate Resonant Tunneling Diodes (RTD) in a silicon process. To investigate the expected performances of such technologies, a complete DC and AC compact model of silicon RTD has been proposed, and implemented in a circuit simulator. RTD based RF oscillators have been simulated and compared to more conventional silicon circuits. Even if SOI based RTD offers lower performances than their III-V counterparts, it turns out that extremely low power RF oscillator at 20 GHz can be realized on silicon using this technology.","PeriodicalId":258889,"journal":{"name":"2009 Proceedings of ESSCIRC","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-11-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Challenges and prospects of RF oscillators using silicon resonant tunneling diodes\",\"authors\":\"E. Buccafurri, A. Medjahdi, F. Calmon, R. Clerc, M. Pala, A. Poncet, G. Ghibaudo\",\"doi\":\"10.1109/ESSCIRC.2009.5325989\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Advanced SOI and strained-SOI (s-SOI) technologies may be an alternative option to integrate Resonant Tunneling Diodes (RTD) in a silicon process. To investigate the expected performances of such technologies, a complete DC and AC compact model of silicon RTD has been proposed, and implemented in a circuit simulator. RTD based RF oscillators have been simulated and compared to more conventional silicon circuits. Even if SOI based RTD offers lower performances than their III-V counterparts, it turns out that extremely low power RF oscillator at 20 GHz can be realized on silicon using this technology.\",\"PeriodicalId\":258889,\"journal\":{\"name\":\"2009 Proceedings of ESSCIRC\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-11-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 Proceedings of ESSCIRC\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSCIRC.2009.5325989\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 Proceedings of ESSCIRC","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSCIRC.2009.5325989","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Challenges and prospects of RF oscillators using silicon resonant tunneling diodes
Advanced SOI and strained-SOI (s-SOI) technologies may be an alternative option to integrate Resonant Tunneling Diodes (RTD) in a silicon process. To investigate the expected performances of such technologies, a complete DC and AC compact model of silicon RTD has been proposed, and implemented in a circuit simulator. RTD based RF oscillators have been simulated and compared to more conventional silicon circuits. Even if SOI based RTD offers lower performances than their III-V counterparts, it turns out that extremely low power RF oscillator at 20 GHz can be realized on silicon using this technology.