al /sub 48/In深圈闭表征。/sub 52/As/In/sub .52/(Ga/sub .7/Al/sub .3/)/sub .48/As异质结构

K. Rezzoug, F. Ducroquet, G. Guillot, L. Giraudet, J.P. Praseuth
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引用次数: 2

摘要

用深能级瞬态光谱研究了AlInAs/ in /sub .52/(Ca/sub - 1-x/Al/sub . x/)/sub .48/As (x=0.3)异质结构中的电子陷阱。在四元层和三元层中分别观察到活化能为0.31和0.59 eV的两个优势圈闭。这两个层次都被认为是同一根源的内在缺陷。在AlInAs/InCaAlAs接口处检测到E/sub c/-0.4 eV的另一个缺陷。发现该陷阱的浓度在晶圆上分布不均匀,可能存在杂质污染。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deep trap characterization of Al./sub 48/In./sub 52/As/In/sub .52/(Ga/sub .7/Al/sub .3/)/sub .48/As heterostructures
Electron traps in AlInAs/In/sub .52/(Ca/sub 1-x/Al/sub x/)/sub .48/As (x=0.3) heterostructures are investigated by deep level transient spectroscopy. Two dominant traps with activation energies of 0.31 and 0.59 eV are observed in quaternary and ternary layers respectively. Both these levels are supposed to be intrinsic defects from the same origin. Another defect at E/sub c/-0.4 eV is detected at the AlInAs/InCaAlAs interface. The concentration of this trap is found to be non uniformly distributed on the wafer and possible impurity contamination is suggested.
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