{"title":"闪蒸碲化铋薄膜","authors":"K. Miyazaki, T. Shirakawa, H. Tsukamoto","doi":"10.1109/ICT.2006.331390","DOIUrl":null,"url":null,"abstract":"In this study, thermoelectric thin films are deposited on glass plates by using a flash evaporation method. We evaporated fine powders of 20% Bi2Te3-80% Sb2Te3 as a p-type and those of 90% Bi2Te3-10% Bi2Se3 as an n-type. We measured thermoelectric properties, such as Seebeck coefficient, alpha, the electrical resistivity, rho, and thermal conductivity, lambda, at room temperature. Flash evaporated p-type thin films show high values of thermoelectric properties: alpha = 199 muV/K, and rho = 14 mOmegamiddotcm at 300 K, and the n-type thin films show alpha = -30 muV/K, and rho = 3 mOmegamiddotcm. The fabricated thin films are annealed at 200 to 400 degC for 1 hour in argon for the improvement of the thermoelectric properties. The electrical resistivity of the p-type thin films reduces as annealing temperature increases, and it reaches 1.8 mOmegamiddotcm at annealing temperature of 400 degC. Seebeck coefficient of the thin films reaches 218 muV/K at annealing temperature of 300 degC. On the other hand, the electrical resistivity of the n-type thin films reduces to 2 mOmegamiddotcm at annealing temperature of 350 degC, and Seebeck coefficient of the thin films increases to -163 muV/K at annealing temperature of 300 degC. The measured thermal conductivity of an n-type thin film annealed at 200 degC is 1.2 W/(mmiddotK). EPMA measurements and SEM observations are carried out to consider the mechanisms of improvements of thermoelectric properties","PeriodicalId":346555,"journal":{"name":"2006 25th International Conference on Thermoelectrics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Flash Evaporated Thin Films of Bismuth Telluride\",\"authors\":\"K. Miyazaki, T. Shirakawa, H. Tsukamoto\",\"doi\":\"10.1109/ICT.2006.331390\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this study, thermoelectric thin films are deposited on glass plates by using a flash evaporation method. We evaporated fine powders of 20% Bi2Te3-80% Sb2Te3 as a p-type and those of 90% Bi2Te3-10% Bi2Se3 as an n-type. We measured thermoelectric properties, such as Seebeck coefficient, alpha, the electrical resistivity, rho, and thermal conductivity, lambda, at room temperature. Flash evaporated p-type thin films show high values of thermoelectric properties: alpha = 199 muV/K, and rho = 14 mOmegamiddotcm at 300 K, and the n-type thin films show alpha = -30 muV/K, and rho = 3 mOmegamiddotcm. The fabricated thin films are annealed at 200 to 400 degC for 1 hour in argon for the improvement of the thermoelectric properties. The electrical resistivity of the p-type thin films reduces as annealing temperature increases, and it reaches 1.8 mOmegamiddotcm at annealing temperature of 400 degC. Seebeck coefficient of the thin films reaches 218 muV/K at annealing temperature of 300 degC. On the other hand, the electrical resistivity of the n-type thin films reduces to 2 mOmegamiddotcm at annealing temperature of 350 degC, and Seebeck coefficient of the thin films increases to -163 muV/K at annealing temperature of 300 degC. The measured thermal conductivity of an n-type thin film annealed at 200 degC is 1.2 W/(mmiddotK). EPMA measurements and SEM observations are carried out to consider the mechanisms of improvements of thermoelectric properties\",\"PeriodicalId\":346555,\"journal\":{\"name\":\"2006 25th International Conference on Thermoelectrics\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 25th International Conference on Thermoelectrics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICT.2006.331390\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 25th International Conference on Thermoelectrics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICT.2006.331390","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In this study, thermoelectric thin films are deposited on glass plates by using a flash evaporation method. We evaporated fine powders of 20% Bi2Te3-80% Sb2Te3 as a p-type and those of 90% Bi2Te3-10% Bi2Se3 as an n-type. We measured thermoelectric properties, such as Seebeck coefficient, alpha, the electrical resistivity, rho, and thermal conductivity, lambda, at room temperature. Flash evaporated p-type thin films show high values of thermoelectric properties: alpha = 199 muV/K, and rho = 14 mOmegamiddotcm at 300 K, and the n-type thin films show alpha = -30 muV/K, and rho = 3 mOmegamiddotcm. The fabricated thin films are annealed at 200 to 400 degC for 1 hour in argon for the improvement of the thermoelectric properties. The electrical resistivity of the p-type thin films reduces as annealing temperature increases, and it reaches 1.8 mOmegamiddotcm at annealing temperature of 400 degC. Seebeck coefficient of the thin films reaches 218 muV/K at annealing temperature of 300 degC. On the other hand, the electrical resistivity of the n-type thin films reduces to 2 mOmegamiddotcm at annealing temperature of 350 degC, and Seebeck coefficient of the thin films increases to -163 muV/K at annealing temperature of 300 degC. The measured thermal conductivity of an n-type thin film annealed at 200 degC is 1.2 W/(mmiddotK). EPMA measurements and SEM observations are carried out to consider the mechanisms of improvements of thermoelectric properties