用于毫米波低噪声InP hemt的新型GaInAs/InAs/InP复合通道

D. C. Ruiz, Tamara Saranovac, D. Han, O. Ostinelli, C. Bolognesi
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引用次数: 1

摘要

具有复合GaInAs/InAs通道的基于inp的hemt由于其优越的载流子传输特性而具有高频率性能。另一方面,在GaInAs通道中增加InP子通道可以有效抑制通道冲击电离,降低输出电导,改善噪声特性。虽然文献提供了许多关于这两种不同方法的报道,但我们在本研究中合并了这两种策略,并报道了第一个GaInAs/InAs/InP复合通道hemt。通过直流、射频和噪声特性研究了InAs插入位置的影响。由于栅极泄漏电流的降低,嵌入InAs的器件在远离AlInAs屏障顶部的位置显示出更高的最小噪声系数NFMIN。NFMIN的改进伴随着输出特性和截止频率的轻微下降,这是由于增加了平均栅极到2℃的分离。我们的研究结果表明,InAs插入和InP子信道的组合为宽带低噪声应用开辟了有前途的HEMT设计途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
New GaInAs/InAs/InP Composite Channels for mm-Wave Low-Noise InP HEMTs
InP-based HEMTs with composite GaInAs/InAs channels are recognized for their high frequency performance thanks to their superior carrier transport properties. On the other hand, the addition of an InP subchannel to a GaInAs channel can effectively suppress channel impact ionization, lower the output conductance, and improve noise properties. Although the literature provides a number of reports about both separate approaches, we merge both strategies in the present study and report the first GaInAs/InAs/InP composite channel HEMTs. The influence of the InAs inset location is studied through DC, RF and noise characterization. Devices with the InAs inset located further from the top AlInAs barrier exhibit an improved minimum noise figure NFMIN due to a reduced gate leakage current. The NFMIN improvement is accompanied by a slight degradation in both the output characteristics and cutoff frequencies resulting from the increased average gate-to-2DEG separation. Our results indicate that the combination of an InAs inset and an InP subchannel opens promising HEMT design avenues for broadband low-noise applications.
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