偏置目标离子束沉积源标定问题

2014 Conference on Optoelectronic and Microelectronic Materials & Devices Pub Date : 2014-12-01 DOI:10.1109/COMMAD.2014.7038674

N. RadhaKrishnan, R. Jeffery, M. Martyniuk, R. Woodward, J. H. Dell, L. Faraone

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引用次数: 0

摘要

我们报告了与偏置目标离子束沉积系统校准相关的问题。在不同靶材的薄膜沉积后立即沉积单个金属氧化物薄膜时，与在同一靶材的薄膜之后沉积时相比，已经观察到沉积速率和氧流量的变化。

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Issues in source calibration for biased target ion beam deposition

We report issues associated with the calibration of a biased target ion beam deposition system. Variations in deposition rates and oxygen flow have been observed when depositing individual metal oxide films immediately after films deposited from different targets as compared to depositions following films from the same target.

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来源期刊

2014 Conference on Optoelectronic and Microelectronic Materials & Devices

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