B. L. La Fontaine, D. Gaines, D. Kania, G. Sommargren, S. Baker, D. Ciarlo
{"title":"λ=13nm双镜四反射环场光学系统的性能","authors":"B. L. La Fontaine, D. Gaines, D. Kania, G. Sommargren, S. Baker, D. Ciarlo","doi":"10.1364/eul.1996.eie186","DOIUrl":null,"url":null,"abstract":"The performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137µm were successfuly printed, a resolution of 0.175µm better represents the performance of the system over the full 0.9mm2 image field. The contrast of the aerial image was estimated to be approximately 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function (MTF) due to the presence of scattered light in the image.","PeriodicalId":201185,"journal":{"name":"Extreme Ultraviolet Lithography (TOPS)","volume":"134 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm\",\"authors\":\"B. L. La Fontaine, D. Gaines, D. Kania, G. Sommargren, S. Baker, D. Ciarlo\",\"doi\":\"10.1364/eul.1996.eie186\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137µm were successfuly printed, a resolution of 0.175µm better represents the performance of the system over the full 0.9mm2 image field. The contrast of the aerial image was estimated to be approximately 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function (MTF) due to the presence of scattered light in the image.\",\"PeriodicalId\":201185,\"journal\":{\"name\":\"Extreme Ultraviolet Lithography (TOPS)\",\"volume\":\"134 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Extreme Ultraviolet Lithography (TOPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/eul.1996.eie186\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Extreme Ultraviolet Lithography (TOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/eul.1996.eie186","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Performance of a Two-Mirror, Four-Reflection, Ring-Field Optical System Operating at λ=13nm
The performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137µm were successfuly printed, a resolution of 0.175µm better represents the performance of the system over the full 0.9mm2 image field. The contrast of the aerial image was estimated to be approximately 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function (MTF) due to the presence of scattered light in the image.
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