用于自保护输出驱动器的LDMOS器件的ESD可扩展性

Young S. Chung, Hongzhong Xu, R. Ida, W. Min, B. Baird
{"title":"用于自保护输出驱动器的LDMOS器件的ESD可扩展性","authors":"Young S. Chung, Hongzhong Xu, R. Ida, W. Min, B. Baird","doi":"10.1109/ISPSD.2005.1488023","DOIUrl":null,"url":null,"abstract":"Lateral DMOS (LDMOS) power transistors of SMART technologies are widely used as output drivers in multiple applications. However, LDMOS devices are generally not robust under ESD due to deep snapback causing localized current crowding and leading to inhomogeneous triggering of the parasitic bipolar, ESD ruggedness of LDMOS power devices has been a significant subject in smart power IC technology. Lack of understanding in geometry scalability of the LDMOS devices often thwarts a proper implementation of self-protected structures. Therefore, it is necessary to understand the ESD scalability and failure mechanism of the power output devices to meet various levels of design requirement and optimize ESD protection solution. LDMOS devices ESD capability has been understood from snapback breakdown of the parasitic bipolar components. They usually show different behavior under ESD stress conditions, compared to the normal MOS transistors. The triggering mechanism of the snapback breakdown has been major subjects in terms of device structures and designs. In this paper, we report an ESD capability and scalability of the LDMOS devices from the geometry and operational aspects, employing both experimental and simulation data. Difference of transient electrical behaviors and failure mechanisms of DMOS with different geometries under ESD stress conditions is also addressed","PeriodicalId":154808,"journal":{"name":"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.","volume":"54 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"21","resultStr":"{\"title\":\"ESD Scalability of LDMOS Devices for Self-Protected Output Drivers\",\"authors\":\"Young S. Chung, Hongzhong Xu, R. Ida, W. Min, B. Baird\",\"doi\":\"10.1109/ISPSD.2005.1488023\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Lateral DMOS (LDMOS) power transistors of SMART technologies are widely used as output drivers in multiple applications. However, LDMOS devices are generally not robust under ESD due to deep snapback causing localized current crowding and leading to inhomogeneous triggering of the parasitic bipolar, ESD ruggedness of LDMOS power devices has been a significant subject in smart power IC technology. Lack of understanding in geometry scalability of the LDMOS devices often thwarts a proper implementation of self-protected structures. Therefore, it is necessary to understand the ESD scalability and failure mechanism of the power output devices to meet various levels of design requirement and optimize ESD protection solution. LDMOS devices ESD capability has been understood from snapback breakdown of the parasitic bipolar components. They usually show different behavior under ESD stress conditions, compared to the normal MOS transistors. The triggering mechanism of the snapback breakdown has been major subjects in terms of device structures and designs. In this paper, we report an ESD capability and scalability of the LDMOS devices from the geometry and operational aspects, employing both experimental and simulation data. Difference of transient electrical behaviors and failure mechanisms of DMOS with different geometries under ESD stress conditions is also addressed\",\"PeriodicalId\":154808,\"journal\":{\"name\":\"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.\",\"volume\":\"54 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"21\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2005.1488023\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2005.1488023","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 21

摘要

SMART技术的横向DMOS (LDMOS)功率晶体管作为输出驱动器被广泛应用于多个领域。然而,LDMOS器件在ESD下的稳健性通常不高,因为深度回吸会引起局部电流拥挤,导致寄生双极的不均匀触发,因此LDMOS功率器件的ESD稳健性一直是智能功率IC技术中的一个重要课题。缺乏对LDMOS器件几何可扩展性的理解往往会阻碍自保护结构的正确实现。因此,有必要了解功率输出器件的ESD可扩展性和失效机制,以满足不同层次的设计需求,并优化ESD保护解决方案。从寄生双极元件的回跳击穿可以理解LDMOS器件的ESD能力。与普通MOS晶体管相比,它们通常在ESD应力条件下表现出不同的行为。回跳击穿的触发机制一直是器件结构和设计中的重要课题。在本文中,我们利用实验和仿真数据,从几何和操作方面报告了LDMOS器件的ESD能力和可扩展性。讨论了不同几何形状的DMOS在ESD应力条件下的瞬态电学行为和失效机制的差异
本文章由计算机程序翻译,如有差异,请以英文原文为准。
ESD Scalability of LDMOS Devices for Self-Protected Output Drivers
Lateral DMOS (LDMOS) power transistors of SMART technologies are widely used as output drivers in multiple applications. However, LDMOS devices are generally not robust under ESD due to deep snapback causing localized current crowding and leading to inhomogeneous triggering of the parasitic bipolar, ESD ruggedness of LDMOS power devices has been a significant subject in smart power IC technology. Lack of understanding in geometry scalability of the LDMOS devices often thwarts a proper implementation of self-protected structures. Therefore, it is necessary to understand the ESD scalability and failure mechanism of the power output devices to meet various levels of design requirement and optimize ESD protection solution. LDMOS devices ESD capability has been understood from snapback breakdown of the parasitic bipolar components. They usually show different behavior under ESD stress conditions, compared to the normal MOS transistors. The triggering mechanism of the snapback breakdown has been major subjects in terms of device structures and designs. In this paper, we report an ESD capability and scalability of the LDMOS devices from the geometry and operational aspects, employing both experimental and simulation data. Difference of transient electrical behaviors and failure mechanisms of DMOS with different geometries under ESD stress conditions is also addressed
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