高温退火过程中多孔层烧结的模拟

T. B. Govorukha, N. Shwartz, Z. Yanovitskaja, A. V. Zverev
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引用次数: 0

摘要

采用蒙特卡罗模拟方法研究了多孔层在退火过程中的转变动力学。采用原始立方晶格模型进行计算。退火初期成膜速率随时间的变化呈幂型:~t-γ (1/5 < γ <1/3)。在任何孔隙率下,薄膜厚度在退火过程中以离散的步骤减小。当部分孔隙同时从体向表面伸出时,膜厚发生不连续变化。厚度变化约为平均孔径,厚度突然变化的间隔时间远远超过膜厚跳跃的持续时间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simulation of Porous Layer Sintering During High-Temperature Annealing
Kinetic of porous layers transformation during annealing was investigated using Monte Carlo simulation. Model with primitive cubic lattice was used for calculations. Time dependence of film evolution rate at initial stage of annealing process was demonstrated to be power type: ~t-γ (1/5 < γ <1/3). At any porosity film thickness decreases in discrete steps during annealing. The discontinuous change of film thickness takes place when portion of pores simultaneously comes out from the bulk to the surface. Thickness change is about average pore size, and periods between sudden thickness changes far exceed duration of film thickness jumps.
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