PMOS热载流子降解的加速因子

H. Katto
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引用次数: 0

摘要

详细研究了热载流子(HC)降解的加速因素。在使用条件下的外推寿命发现比简单地以传统方式解释的直流压力测试可能预期的寿命长得多。新的发现是:(1)LOG(寿命)取决于应力V/sub D/,而不是像nmosfet那样取决于1/V/sub D/,而是取决于1/(|V/sub D/-V/sub 0/),其中常数V/sub 0/是应力V/sub G/的弱函数;(2)装置参数具有不同的加速度因子;/spl σ /I/sub ds/在使用条件下比V/sub T/或I/sub ds/(在V/sub cc//2时)退化得慢;(3) PMOSFET降解缓慢的另一个原因是:被捕获的电子从氧化物释放回硅(Brox等人,IEEE译)。第41卷,1184-1196页,1994年)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Acceleration factors of PMOS hot carrier degradation
The acceleration factors of hot carrier (HC) degradation are investigated in detail for scaled PMOSFETs. Extrapolated lifetimes under usage conditions are found to be much longer than might be expected from DC stress tests simply interpreted in a traditional manner. The new findings are: (1) the LOG(lifetime) depends on stress-V/sub D/ not by a factor 1/V/sub D/ as in NMOSFETs, but by 1/(|V/sub D/-V/sub 0/), where the constant V/sub 0/ is a weak function of stress-V/sub G/; (2) device parameters have different acceleration factors; /spl Sigma/I/sub ds/, which best represents inverter operation, degrades more slowly than V/sub T/ or I/sub ds/ (at V/sub cc//2) under usage condition; (3) the PMOSFET degradation can be slow for another reason: the release of trapped electrons from oxide back to the silicon (Brox et al, IEEE Trans. vol. ED-41, pp. 1184-1196, 1994).
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