利用SSLE技术对伽马探测器LYSO晶体像素化的模拟、测试和结果

G. Konstantinou, R. Chil, J. Ripoll, J. Udías, M. Desco, J. Vaquero
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引用次数: 3

摘要

用于PET扫描仪的伽马辐射探测器的闪烁体晶体最常见的拓扑结构之一是像素化。这些像素的大小、晶体表面处理和晶体间插入的反射器厚度直接影响探测器的能量和空间分辨率以及灵敏度。像素的制造是费力的,复杂的和昂贵的。在这里,我们研究了使用经过验证的Nd:YAG激光亚表面激光雕刻技术在单片LYSO闪烁体晶体中产生像素的可能性。考虑到雕刻过程的局限性,为了评估可能的设计,我们使用模拟软件GAMOS来分析具有各种图案的晶体内的光传播。我们进行了不同的实验程序,包括显微镜和激光反射法来评估雕刻表面的相对反射质量。我们比较了不同的雕刻程序的结果,通常用于这类像素化晶体矩阵的参考反射器。我们已经配置了不同的雕刻表面与可变透明度在几个像素几何包括交互深度编码模式。我们的结果表明,用这种方法雕刻的像素也可以配置为补偿多路读出的损失,同时保持检测器的性能要求。这种雕刻图案的修改几乎没有成本,并且构成了工业制造的一个非常有前途的解决方案,大大降低了探测器的成本。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Simulations, testing and results for the pixelation of LYSO crystals for gamma detectors using SSLE techniques
One of the most common topologies for the scintillator crystals used in gamma radiation detectors for PET scanners is pixelation. The size of these pixels, the crystal surface treatment and the reflector thickness inserted between crystals directly affects the energy and the spatial resolution as well as the sensitivity of the detector. The fabrication of pixels is laborious, complex and expensive. Here we investigate the possibility of creating pixels within monolithic LYSO scintillators crystals using the proven technique of sub-surface laser engraving with a Nd:YAG laser. To evaluate possible designs considering the limitations of the engraving procedure, we used the simulation software GAMOS to analyze the light propagation inside the crystals engraved with a variety of patterns. We carried out different experimental procedures, including microscopy and laser reflectometry to assess the relative reflective quality of the engraved surfaces. We compared the results of different engraving procedures to a reference reflector commonly used in this type of pixelated crystal matrices. We have configured different engraved surfaces with variable transparency in several pixel geometries including depth-of-interaction encoding patterns. Our results demonstrate that pixels engraved with this method can also be configured to compensate for the multiplexed readout penalties, and at the same time preserve the detector performance requirements. Such modifications of the engraving pattern takes place at practically no cost and constitute a highly promising solution for industrial fabrication, reducing substantially the cost of the detector.
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