0.25μm, 20V高性能互补双极晶体管,具有双EPI和氧化物填充深沟槽隔离,用于高频DC-DC转换器

T. Kwon, S. Haynie, A. Sadovnikov, P. Allard, J. Strout, A. Strachan
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引用次数: 3

摘要

电源设计人员必须提高转换器的开关频率,以满足工业对小尺寸的需求。为了处理高开关频率,闭环DC-DC变换器需要一个低Rdson的高速误差放大器。Qg LDMOS电源开关。本文研制了0.25um, 20V的高性能互补双极晶体管,用于高速误差放大器的设计。双肾上腺素被用来抑制寄生双极行为,导致闭锁。此外,一个充满氧化物的深沟槽隔离被用来最小化寄生电容。结果,稳健的5GHz NPN和3GHz PNP晶体管被集成在一个低的Rdson上。路上LDMOS。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
0.25μm, 20V high performance complementary bipolar transistor with dual EPI and oxide-filled deep trench isolation for high frequency DC-DC converters
Power supply designers must increase the switching frequency of converters to meet industry demands for small sizes. In order to handle high switching frequency, a closed-loop DC-DC converter needs a high-speed error amplifier with low Rdson.Qg LDMOS power switches. In this paper, 0.25um, 20V high performance complementary bipolar transistors were developed for the high-speed error amplifier design. Dual epi was used to suppress parasitic bipolar behavior that leads to a latch-up. Also, an oxide-filled deep trench isolation was used to minimize parasitic capacitance. As a result, robust 5GHz NPN and 3GHz PNP transistors were integrated with a low Rdson.Qg LDMOS.
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