{"title":"双栅极MOSFET漏极体带对带隧穿分析","authors":"H. Ananthan, A. Bansal, K. Roy","doi":"10.1109/SOI.2005.1563573","DOIUrl":null,"url":null,"abstract":"An analytical model is proposed for drain-to-body band-to-band tunneling leakage in nanoscale symmetric and asymmetric double-gate MOS devices. The model is used to analyze the impact of technology and circuit parameters, and suggest ways of minimizing this leakage.","PeriodicalId":116606,"journal":{"name":"2005 IEEE International SOI Conference Proceedings","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Analysis of drain-to-body band-to-band tunneling in double gate MOSFET\",\"authors\":\"H. Ananthan, A. Bansal, K. Roy\",\"doi\":\"10.1109/SOI.2005.1563573\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An analytical model is proposed for drain-to-body band-to-band tunneling leakage in nanoscale symmetric and asymmetric double-gate MOS devices. The model is used to analyze the impact of technology and circuit parameters, and suggest ways of minimizing this leakage.\",\"PeriodicalId\":116606,\"journal\":{\"name\":\"2005 IEEE International SOI Conference Proceedings\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE International SOI Conference Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOI.2005.1563573\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE International SOI Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.2005.1563573","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Analysis of drain-to-body band-to-band tunneling in double gate MOSFET
An analytical model is proposed for drain-to-body band-to-band tunneling leakage in nanoscale symmetric and asymmetric double-gate MOS devices. The model is used to analyze the impact of technology and circuit parameters, and suggest ways of minimizing this leakage.