外源gm记录为1105 mS/mm的自对准n极性GaN/InAlN hemt的阱相关延迟分析

N. Nidhi, S. Dasgupta, J. Lu, F. Wu, S. Keller, J. Speck, U. Mishra
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引用次数: 3

摘要

由于具有高极化电荷和低电阻通道,用于hemt的ga -极性inaln电荷诱导势垒最近被证明是一种可行的高频应用技术[1,2]。在本文中,我们报道了mbe生长的n极性GaN/InAlN hemt具有优异的直流和射频性能。n极MBE InAlN器件的直流和射频数据存在差异,通过多次测量和分析解释了这一差异,并讨论了可能的解决办法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Trap-related delay analysis of self-aligned N-polar GaN/InAlN HEMTs with record extrinsic gm of 1105 mS/mm
Ga-polar InAlN-based charge-inducing barrier for HEMTs have been recently demonstrated as a viable technology for high frequency applications due to high polarization charge and hence, low resistance channels [1,2]. In this paper, we report on MBE-grown N-polar GaN/InAlN HEMTs with excellent DC and RF performance. There exists a discrepancy in the DC and RF data for N-polar MBE InAlN devices which is explained through several measurements and analysis and possible solutions are discussed.
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