CMOS图像传感器技术与系统集成

J. Holz, I. Koren, U. Ramacher
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引用次数: 0

摘要

与CCD器件相比,CMOS图像传感器的主要缺点是由于CMOS光电二极管的量子效率较低和泄漏电流较大,在低照度下图像质量下降。本文提出了一种新型的光电二极管结构。仅对原始CMOS工艺进行了微小的更改,不影响其他器件的参数。与源漏结型光电二极管相比,该新型光电二极管的量子效率提高了近一倍,漏电流降低了近2个数量级。该概念预计也适用于未来的CMOS工艺。这使得在单个CMOS芯片上集成传感器和信号处理的系统优势可用于需要在低光照水平下获得良好图像质量的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Technology and System Integration of CMOS Image Sensors
The major drawback of the CMOS image sensors when compared to CCD devices is reduced image quality at low illumination due to lower quantum efficiency and larger leakage current of the CMOS photodiodes. In this paper, a novel photodiode structure is presented. Only minor changes to the original CMOS process were applied that don't affect the parameters of other devices. The quantum efficiency of the novel photodiode was nearly doubled and the leakage current was decreased by almost 2 orders of magnitude with respect to a source/drain junction photodiode. The concept is expected to be also applicable to future CMOS processes. This makes the benefits of the system integration of sensor and signal processing on a single CMOS chip available to applications requiring good image quality at low-light levels.
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