Extreme ultraviolet lithography for 0.1 /spl mu/m devices

Extreme Ultraviolet Lithography (EUVL) has emerged as one of the leading successors to optics for 0.1 /spl mu/m IC fabrication. Its strongest attribute is the potential to scale to much finer resolution at high throughput. As such, this technique could meet the lithography needs for Si ULSI down to fundamental device limits. In the United States, Lawrence Livermore, Sandia, and Lawrence Berkeley Laboratories are participating in an industry funded research effort to evolve EUV technology and build a prototype camera for lithographic exposure. More recently, both Europe and Japan have initiated government/industry sponsored programs in EUVL development. This talk focuses on program successes to date, and highlights some of the challenges that still lie ahead.